A comparison between V2O5 and WO3 thin films as sensitive elements for NO detection

被引:43
作者
Capone, S [1 ]
Rella, R [1 ]
Siciliano, P [1 ]
Vasanelli, L [1 ]
机构
[1] CNR, IME, Ist Studio Nuovi Mat Elettr, I-73100 Lecce, Italy
关键词
metal oxide; sputtering deposition; gas sensor;
D O I
10.1016/S0040-6090(99)00045-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Vanadium oxide (V2O5) and tungsten oxide (WO3) thin films were investigated with the aim to obtain information about their physical and gas sensing properties. The analysis in the presence of different NO concentrations have shown that both materials are able to detect nitrogen oxide, but their responses exhibit different characteristics. In particular, tungsten oxide was found to be more suitable to be used in the field of application for detecting low concentrations. In addition, a mechanism of detection has been considered. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:264 / 268
页数:5
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