The Electrical Resistivity of Ultra-Thin Copper Films

被引：24
|
作者：
Schmiedl, Ernst [2 ]
Wissmann, Peter [2 ]
Finzel, Hans-Ulrich [1 ]
机构：
[1] FB Chem Hsch Niederrhein, D-47798 Krefeld, Germany
[2] Univ Erlangen Nurnberg, Inst Phys & Theoret Chem, D-8520 Erlangen, Germany
来源：
ZEITSCHRIFT FUR NATURFORSCHUNG SECTION A-A JOURNAL OF PHYSICAL SCIENCES | 2008年 / 63卷 / 10-11期
关键词：
Ultra-Thin Films; Electrical Resistivity;
D O I：
10.1515/zna-2008-10-1118
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The resistivity of ultra-thin metal films is much higher than theoretically predicted by the scattering hypothesis. The effect is discussed with respect to the variation of film thickness for copper films deposited tinder ultra-high vacuum conditions on glass Substrates. The interpretation on the basis or temperature is included into a statistical model leads to reasonable result, even when the variation of consideration, Additional infomation is obtained from photoelectric and field effect measurements.
引用
收藏
页码：739 / 744
页数：6
相关论文
共 50 条
  • [1] ELECTRICAL-RESISTIVITY OF ULTRA-THIN FILMS
    KIERUL, J
    LEDZION, J
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1991, 128 (01): : 117 - 121
  • [2] RESISTIVITY OF ROUGH ULTRA-THIN FILMS
    KIERUL, J
    LEDZION, J
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1992, 129 (02): : K93 - K95
  • [3] Influences of hydrogen on the evolution of the electrical resistivity of ultra-thin sputtered copper films measured in real-time
    Barnat, EV
    Wang, PI
    Nagakura, D
    Lu, TM
    MAGNETIC AND ELECTRONIC FILMS-MICROSTRUCTURE, TEXTURE AND APPLICATION TO DATA STORAGE, 2002, 721 : 73 - 78
  • [4] Ultra-thin nanocrystalline diamond films (<100 nm) with high electrical resistivity
    Lions, Mathieu
    Saada, Samuel
    Mazellier, Jean-Paul
    Andrieu, Francois
    Faynot, Olivier
    Bergonzo, Philippe
    PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2009, 3 (06): : 205 - 207
  • [5] Natural Oxidation of Ultra-Thin Copper Films
    V. A. Semenov
    V. O. Oskirko
    S. V. Rabotkin
    K. V. Oskomov
    A. A. Solovyev
    S. A. Stepanov
    Russian Physics Journal, 2018, 60 : 1559 - 1564
  • [6] Natural Oxidation of Ultra-Thin Copper Films
    Semenov, V. A.
    Oskirko, V. O.
    Rabotkin, S. V.
    Oskomov, K. V.
    Solovyev, A. A.
    Stepanov, S. A.
    RUSSIAN PHYSICS JOURNAL, 2018, 60 (09) : 1559 - 1564
  • [7] Size Effects on the Electrical Resistivity of the Ultra-Thin Metallic Film
    Paja, A.
    Dzialo, A.
    ACTA PHYSICA POLONICA A, 2014, 125 (05) : 1220 - 1223
  • [8] In situ monitoring of electrical resistivity and plasma during pulsed laser deposition growth of ultra-thin silver films
    Novotny, M.
    Fitl, P.
    Irimiciuc, S. A.
    Bulir, J.
    More-Chevalier, J.
    Fekete, L.
    Hruska, P.
    Chertopalov, S.
    Vrnata, M.
    Lancok, J.
    JOURNAL OF APPLIED PHYSICS, 2021, 130 (08)
  • [9] Study of electrical properties of ultra-thin Na films on Si(100)
    Ryzhkov, SV
    Tsukanov, DA
    Gruznev, DV
    Lifshits, VG
    PHYSICS OF LOW-DIMENSIONAL STRUCTURES, 1998, 7-8 : 109 - 115
  • [10] Adhesion trends and growth mode of ultra-thin copper films on MgO
    Zhukovskii, YF
    Kotomin, EA
    Fuks, D
    Dorfman, S
    Stoneham, AM
    Borstel, G
    JOURNAL OF PHYSICS-CONDENSED MATTER, 2004, 16 (28) : 4881 - 4896
12345