Compositional dependence of the absorption edge and dark currents in Ge1-x-ySixSny/Ge(100) photodetectors grown via ultra-low-temperature epitaxy of Ge4H10, Si4H10, and SnD4

被引:37
作者
Beeler, R. T. [1 ]
Xu, Chi [2 ]
Smith, D. J. [2 ]
Grzybowski, G. [1 ]
Menendez, J. [2 ]
Kouvetakis, J. [1 ]
机构
[1] Arizona State Univ, Dept Chem & Biochem, Tempe, AZ 85287 USA
[2] Arizona State Univ, Dept Phys, Tempe, AZ 85287 USA
基金
美国国家科学基金会;
关键词
SEMICONDUCTORS; GE; SI(100); DEVICES; ALLOYS;
D O I
10.1063/1.4768217
中图分类号
O59 [应用物理学];
学科分类号
摘要
Lattice-matched Ge1-x-ySixSny (x <= 0.2, y <= 0.05) alloys were deposited defect-free on Ge(001) substrates via low-temperature (330-290 degrees C) reactions of Ge4H10, Si4H10 and SnD4 hydrides, and used to fabricate pin photodetectors. The growth is carried out under gas-source molecular beam epitaxy conditions in a specially designed single-wafer reactor. Optical responsivity measurements reveal absorption edges between 0.88 eV and 0.98 eV, which are used to determine the compositional dependence of the direct band gap. A study of the I-V characteristics of the diodes shows that the dark current is very weakly correlated with the number of Si-Sn bonds in the alloy. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4768217]
引用
收藏
页数:5
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