Development of Low Temperature Curable Positive Tone Photosensitive Dielectric Material

被引：0

作者：

Tanimoto, Akitoshi ^{[1
]}

Abe, Koichi ^{[1
]}

Nobe, Shigeru ^{[2
]}

Matsutani, Hiroshi ^{[1
]}

机构：

[1] Hitachi Chem Co Ltd, Tsukuba Res Lab, 4-13-1 Higashi Cho, Hitachi, Ibaraki 3178555, Japan

[2] Hitachi Chem Co Ltd, Semiconductor Mat Div, Y Hitachi, Ibaraki 3178555, Japan

来源：

2012 2ND IEEE CPMT SYMPOSIUM JAPAN | 2012年

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Recently, low temperature curable photosensitive dielectric materials are attracting much attention in semiconductor package application to avoid thermal damages of the semiconductor devices. AH-1000 is a low temperature curable positive tone photo- definable material. In this paper, we report the mechanical, thermal, and adhesion property of AH-1000 together with its chemical resistance. A wafer level package (WLP) using AH-1000 as redistribution layers indicates that AH-1000 has enough mechanical toughness. It also suggests that higher elongation and lower Young's modulus are effective to eliminate mechanical stress to solder balls for dielectrics.

引用

页数：3