First-principle calculations of CrN(200)/Ni(111) interface: Atomic structure, stability, and electronic properties

被引:9
作者
Zhang, Zhaolu [1 ]
Chen, Jiao [2 ]
He, Guangyu [3 ]
Yang, Guanjun [1 ]
机构
[1] Xi An Jiao Tong Univ, Sch Mat Sci & Engn, State Key Lab Mech Behav Mat, Xian, Peoples R China
[2] Xi An Jiao Tong Univ, State Key Lab Mfg Syst Engn, Xian, Peoples R China
[3] Air Force Engn Univ, Sci & Technol Plasma Dynam Lab, Xian 710049, Peoples R China
关键词
atomic structure; bonding nature; CrN; Ni interface; electronic properties; NI CONTENT; MULTILAYERED COATINGS; MECHANICAL-PROPERTIES; THERMAL-STABILITY; PULSED DC; TIN; TOUGHNESS; CR/CRN; CRN; MICROSTRUCTURE;
D O I
10.1002/sia.6897
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Atomic structure, adhesion energy, and electronic properties of the bonding nature at CrN(200)/Ni(111) interfacial region are studied by first-principle calculations based on density functional theory (DFT). A new method for building the heterostructure of CrN(200)/Ni(111) is proposed to solve the large lattice mismatching between CrN(200) and Ni(111) slab. Three models (OT, ST, and TL) with different interface distance are built up, and the total energy for each of them is calculated. Comparing with other stacking sequence, TL sites with 1.9-angstrom spacing at the interfacial region shows the biggest value of adhesion energy after geometry relaxation. Furthermore, the contour of charge density, partial charge density of states, and Bader charge values of the TL sites with 1.9-angstrom spacing are plotted out and calculated. Results indicate that covalency bonding between Ni and N ions and metallic bonding between Ni and Cr atoms are formed at the interfacial region.
引用
收藏
页码:167 / 175
页数:9
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