Fabrication and characterization of three-dimensional InGaAs/GaAs nanosprings

被引：135

作者：

Bell, DJ

Dong, LX

Nelson, BJ ^{[1
]}

Golling, M

Zhang, L

Grützmacher, D

机构：

[1] ETH, Inst Robot & Intelligent Syst, CH-8092 Zurich, Switzerland

[2] ETH, FIRST Ctr Micro & Nanosci, CH-8093 Zurich, Switzerland

[3] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland

来源：

NANO LETTERS | 2006年 / 6卷 / 04期

关键词：

D O I：

10.1021/nl0525148

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

This paper presents the use of a novel fabrication technique to produce three-dimensional (3D) nanostructures. The process is based on conventional microfabrication techniques to create a planar pattern in an InGaAs/GaAs bilayer that self-assembles into 3D structures during a wet etch release. The nanostructures are proposed to function as nanosprings for electromechanical sensors. Nanomanipulation inside a scanning electron microscope (SEM) was conducted to probe the structures for mechanical characterization. The results were validated by simulation.

引用

收藏

页码：725 / 729

页数：5

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