Fabrication and characterization of three-dimensional InGaAs/GaAs nanosprings

被引：134
|
作者：
Bell, DJ
Dong, LX
Nelson, BJ [1 ]
Golling, M
Zhang, L
Grützmacher, D
机构：
[1] ETH, Inst Robot & Intelligent Syst, CH-8092 Zurich, Switzerland
[2] ETH, FIRST Ctr Micro & Nanosci, CH-8093 Zurich, Switzerland
[3] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
来源：
NANO LETTERS | 2006年 / 6卷 / 04期
关键词：
D O I：
10.1021/nl0525148
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
This paper presents the use of a novel fabrication technique to produce three-dimensional (3D) nanostructures. The process is based on conventional microfabrication techniques to create a planar pattern in an InGaAs/GaAs bilayer that self-assembles into 3D structures during a wet etch release. The nanostructures are proposed to function as nanosprings for electromechanical sensors. Nanomanipulation inside a scanning electron microscope (SEM) was conducted to probe the structures for mechanical characterization. The results were validated by simulation.
引用
收藏
页码：725 / 729
页数：5
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