Quantum compact model for thin-body double-gate Schottky barrier MOSFETs

被引:6
作者
Luan, Su-Zhen [1 ,2 ]
Liu, Hong-Xia [1 ,2 ]
机构
[1] School of Microelectronics, Xidian University
[2] Key Laboratory, Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices
关键词
Effective mass; Electron density; Quantum mechanism effects; Schottky barrier;
D O I
10.1088/1674-1056/17/8/051
中图分类号
学科分类号
摘要
Nanoscale Schottky barrier metal oxide semiconductor field-effect transistors (MOSFETs) are explored by using quantum mechanism effects for thin-body devices. The results suggest that for small nonnegative Schottky barrier heights, even for zero barrier height, the tunnelling current also plays a role in the total on-state current. Owing to the thin body of device, quantum confinement raises the electron energy levels in the silicon, and the tradeoff takes place between the quantum confinement energy and Schottky barrier lowering (SBL). It is concluded that the inclusion of the quantum mechanism effect in this model, which considers an infinite rectangular well with a first-order perturbation in the channel, can lead to the good agreement with numerical result for thin silicon film. The error increases with silicon thickness increasing. © 2008 Chin. Phys. Soc. and IOP Publishing Ltd.
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页码:3077 / 3082
页数:5
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