Large enhancement of third-order nonlinear effects with a resonant all-dielectric metasurface

被引:7
作者
Jafar-Zanjani, Samad [1 ]
Cheng, Jierong [1 ]
Liberman, Vladimir [2 ]
Chou, Jeffrey B. [2 ]
Mosallaei, Hossein [1 ]
机构
[1] Northeastern Univ, Dept Elect & Comp Engn, 360 Huntington Ave, Boston, MA 02115 USA
[2] MIT, Lincoln Lab, Lexington, MA 02420 USA
关键词
ABSORPTION; SILICON;
D O I
10.1063/1.4967818
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A novel low-profile nonlinear metasurface, consisting of a single-layer of all-dielectric material, is proposed and numerically investigated by a nonlinear full-wave finite-difference time-domain (FDTD) method. The proposed metasurface is transparent for low, and opaque for high values of incident light intensity. The metasurface design is broadly applicable to enhancement of intrinsic nonlinearities of any material with a sufficiently high refractive index contrast. We illustrate the ability of this design to enhance intrinsic nonlinear absorption of a transition metal oxide, vanadium pentoxide (V2O5), with resonant metasurface elements. The complex third-order nonlinear susceptibility (chi((3))) for V2O5, representing both nonlinear refraction and absorption is considered in FDTD simulations. Our design achieves high initial transparency (>90%) for low incident light intensity. An order of magnitude decrease in the required input light intensity threshold for nonlinear response of the metasurface is observed in comparison with an unpatterend film. The proposed all-dielectric metasurface in this work is ultrathin and easy to fabricate. We envision a number of applications of this design for thin film coatings that offer protection against high-power laser radiation. (C) 2016 Author(s).
引用
收藏
页数:7
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