Numerical investigation of ion-energy-distribution functions in single and dual frequency capacitively coupled plasma reactors

被引:133
作者
Georgieva, V [1 ]
Bogaerts, A [1 ]
Gijbels, R [1 ]
机构
[1] Univ Instelling Antwerp, Dept Chem, B-2610 Antwerp, Belgium
来源
PHYSICAL REVIEW E | 2004年 / 69卷 / 02期
关键词
D O I
10.1103/PhysRevE.69.026406
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Ion-energy-distribution functions (IEDFs) are numerically investigated in capacitively coupled (cc) radio frequency (rf) Ar/CF4/N-2 discharges by a one-dimensional particle-in-cell/Monte Carlo model. The simulation considers electron-neutral collisions, various kinds of collisions of ions (Ar+, CF3+, N-2(+), F-, and CF3-) with neutral, positive-negative ion, and electron-ion recombination. The influence of pressure, applied voltage amplitude, and applied frequency on the Ar+, CF3+, and N-2(+) IEDFs is presented. The dependence on the frequency regime is investigated by simulations of the Ar/CF4/N-2 mixture in single (13.56 MHz) and dual frequency (2+27 MHz or 1+27 MHz) cc reactors. A comparison of the simulation results with analytical calculations in a collisionless rf sheath is discussed. The results show that the IEDFs shift toward the low energies with increasing pressure or decreasing applied voltage amplitude. The Ar+ and N-2(+) IEDFs exhibit secondary maxima due to the charge transfer collisions. The CF3+ IEDF has a peak at high energies in consistency with the average sheath potential drop. The IEDFs in the dual frequency regime are broad and bimodal.
引用
收藏
页码:026406 / 1
页数:11
相关论文
共 53 条
[1]   The measurement and control of the ion energy distribution function at a surface in an RF plasma [J].
Barton, D ;
Heason, DJ ;
Short, RD ;
Bradley, JW .
MEASUREMENT SCIENCE AND TECHNOLOGY, 2000, 11 (12) :1726-1731
[2]   DIAGNOSTIC ON N-2 PLASMA WITH AN ENERGY-RESOLVED QUADRUPOLE MASS-SPECTROMETER AT THE POWERED ELECTRODE IN A REACTIVE ION ETCHING SYSTEM - ION ENERGY-DISTRIBUTION OF N-2(+) AND N+ [J].
BECKER, F ;
RANGELOW, IW ;
MASSELI, K ;
KASSING, R .
SURFACE & COATINGS TECHNOLOGY, 1995, 74-5 (1-3) :485-490
[3]   ANOMALIES OF ENERGY OF POSITIVE IONS EXTRACTED FROM HIGH-FREQUENCY ION SOURCES . A THEORETICAL STUDY [J].
BENOITCATTIN, P ;
BERNARD, LC .
JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) :5723-+
[4]  
Birdsall C. K., 2018, Plasma Physics via Computer Simulation
[5]   PARTICLE-IN-CELL CHARGED-PARTICLE SIMULATIONS, PLUS MONTE-CARLO COLLISIONS WITH NEUTRAL ATOMS, PIC-MCC [J].
BIRDSALL, CK .
IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (02) :65-85
[6]   ELECTRON-IMPACT CROSS-SECTION DATA FOR CARBON TETRAFLUORIDE [J].
BONHAM, RA .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B) :4157-4164
[7]   CFx radical production and loss in a CF4 reactive ion etching plasma:: Fluorine rich conditions [J].
Booth, JP ;
Cunge, G ;
Chabert, P ;
Sadeghi, N .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (06) :3097-3107
[8]   Self-consistent particle simulation of radio frequency CF4 discharge:: Effect of gas pressure [J].
Denpoh, K ;
Nanbu, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (5A) :2804-2808
[9]   Self-consistent particle simulation of radio-frequency CF4 discharge with implementation of all ion-neutral reactive collisions [J].
Denpoh, K ;
Nanbu, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (03) :1201-1206
[10]  
DENPOH K, THESIS TOHOKU U SEND