Distributed contact flip chip InGaN/GaN blue LED; comparison with conventional LEDs

被引:8
作者
Genc, M. [1 ,2 ]
Sheremet, V. [3 ]
Elci, M. [3 ,4 ]
Kasapoglu, A. E. [5 ,6 ]
Altuntas, I. [7 ]
Demir, I. [7 ]
Egin, G. [1 ]
Islamoglu, S. [8 ]
Gur, Emre [5 ]
Muzafferoglu, N. [1 ]
Elagoz, S. [7 ]
Gulseren, O. [8 ]
Aydinli, A. [9 ]
机构
[1] Ermaksan AS, Optoelect R&D Ctr, TR-16065 Bursa, Turkey
[2] Bursa Tech Univ, Dept Mat Sci & Engn, TR-16310 Bursa, Turkey
[3] Bilkent Univ, Adv Res Labs, TR-06800 Ankara, Turkey
[4] Middle East Tech Univ, Inst Appl Math, TR-06800 Ankara, Turkey
[5] Ataturk Univ, Dept Phys, TR-25240 Erzurum, Turkey
[6] Ataturk Univ, East Anatolia High Technol Applicat & Res Ctr, TR-25240 Erzurum, Turkey
[7] Cumhuriyet Univ, Nanotechnol Res Ctr, TR-58140 Sivas, Turkey
[8] Bilken Univ, Dept Phys, TR-06800 Ankara, Turkey
[9] Uludag Univ, Elect & Elect Engn Dept, TR-16059 Bursa, Turkey
关键词
Light emitting diodes; Luminescence; LED performance; Current distribution; LIGHT-EMITTING-DIODES;
D O I
10.1016/j.spmi.2019.01.008
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
This paper presents high performance, GaN/InGaN-based light emitting diodes (LEDs) in three different device configurations, namely Top Emitting (TE) LED, conventional Flip Chip (FC) and Distributed Contact (DC) FC. Series resistances as low as 1.1 Omega have been obtained from FC device configurations with a back reflecting ohmic contact of Ni/Au/RTA/Ni/Ag metal stack. A small shift has been observed between electroluminescence (EL) emissions of TE LED and the FC LEDs. In addition, FWHM value of the EL emission of DCFC LED has shown the minimum value of 160 meV (26.9 nm). Furthermore, DCFC LED configuration has shown the highest quantum efficiency and power output, with 330 mW at 500 mA current injection, compared to that of traditional wire bonded TE LEDs and the conventional FC LEDs.
引用
收藏
页码:9 / 13
页数:5
相关论文
共 17 条
  • [1] N-Polar III-Nitride Green (540 nm) Light Emitting Diode
    Akyol, Fatih
    Nath, Digbijoy N.
    Gur, Emre
    Park, Pil Sung
    Rajan, Siddharth
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2011, 50 (05)
  • [2] The effects of two-stage HT-GaN growth with different V/III ratios during 3D-2D transition
    Altuntas, Ismail
    Demir, Ilkay
    Kasapoglu, Ahmet Emre
    Mobtakeri, Soheil
    Gur, Emre
    Elagoz, Sezai
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2018, 51 (03)
  • [3] Optical characterization of magnesium incorporation in p-GaN layers for core-shell nanorod light-emitting diodes
    Girgel, I
    Satka, A.
    Priesol, J.
    Coulon, P-M
    Le Boulbar, E. D.
    Batten, T.
    Allsopp, D. W. E.
    Shields, P. A.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2018, 51 (15)
  • [4] Photoelectrochemical Liftoff of Patterned Sapphire Substrate for Fabricating Vertical Light-Emitting Diode
    Hsieh, Chieh
    Chen, Horng-Shyang
    Liao, Che-Hao
    Chen, Chih-Yen
    Lin, Chun-Han
    Lin, Cheng-Hung
    Ting, Shao-Ying
    Yao, Yu-Feng
    Chen, Hao-Tsung
    Kiang, Yean-Woei
    Yang, Chih-Chung
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2012, 24 (19) : 1775 - 1777
  • [5] Performance of InGaN-Based Thin-Film LEDs With Flip-Chip Configuration and Concavely Patterned Surface Fabricated on Electroplating Metallic Substrate
    Hu, Xiao-Long
    Qi, Zhao-Yi
    Wang, Hong
    Zhang, Xi-Chun
    [J]. IEEE PHOTONICS JOURNAL, 2016, 8 (01):
  • [6] High-brightness InGaN-GaN flip-chip light-emitting diodes with triple-light scatteriny layers
    Lee, Chia-En
    Lee, Yea-Chen
    Kuo, Hao-Chung
    Lu, Tien-Chang
    Wang, Shing-Chung
    [J]. IEEE PHOTONICS TECHNOLOGY LETTERS, 2008, 20 (5-8) : 659 - 661
  • [7] InGaN-Based High-Power Flip-Chip LEDs With Deep-Hole-Patterned Sapphire Substrate by Laser Direct Beam Drilling
    Lee, Jae-Hoon
    Hwang, Seok-Min
    Kim, Nam-Seung
    Lee, Jung-Hee
    [J]. IEEE ELECTRON DEVICE LETTERS, 2010, 31 (07) : 698 - 700
  • [8] Numerical simulation and experimental investigation of GaN-based flip-chip LEDs and top-emitting LEDs
    Liu, Xingtong
    Zhou, Shengjun
    Gao, Yilin
    Hu, Hongpo
    Liu, Yingce
    Gui, Chengqun
    Liu, Sheng
    [J]. APPLIED OPTICS, 2017, 56 (34) : 9502 - 9509
  • [9] High power InGaN/GaN flip-chip LEDs with via-hole-based two-level metallization electrodes
    Lv, Jiajiang
    Zheng, Chenju
    Chen, Quan
    Zhou, Shengjun
    Liu, Sheng
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2016, 213 (12): : 3150 - 3156
  • [10] RF-molecular beam epitaxy growth and properties of InN and related alloys
    Nanishi, Y
    Saito, Y
    Yamaguchi, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2003, 42 (5A): : 2549 - 2559