Single-Photon and Two-Photon Induced Photocleavage for Monolayers of an Alkyltriethoxysilane with a Photoprotected Carboxylic Ester

被引：58

作者：

Alvarez, Marta ^{[1
,2
]}

Best, Andreas ^{[2
]}

Pradhan-Kadam, Swapna ^{[2
]}

Koynov, Kaloian ^{[2
]}

Jonas, Ulrich

Kreiter, Maximilian ^{[2
]}

机构：

[1] FORTH IESL, Iraklion 71110, Greece

[2] Max Planck Inst Polymer Res, D-55128 Mainz, Germany

来源：

ADVANCED MATERIALS | 2008年 / 20卷 / 23期

关键词：

D O I：

10.1002/adma.200800746

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The photochemical structuring of a polysiloxane monolayer protected with a photocleavable group is shown by femtosecond laser pulses in the near-infrared. These experiments suggest a two-photon induced deprotection process that holds great promise for near-field monolayer photolithography far below the diffraction limit.

引用

页码：4563 / 4567

页数：5

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