Temperature dependence of the EUV responsivity of silicon photodiode detectors

被引:14
作者
Kjornrattanawanich, B [1 ]
Korde, R
Boyer, CN
Holland, GE
Seely, JF
机构
[1] Univ Space Res Assoc, Brookhaven Natl Lab, Natl Synchrotron Light Source, Upton, NY 11973 USA
[2] Int Radiat Detectors Inc, Torrance, CA 90505 USA
[3] Praxis Inc, Alexandria, VA 22314 USA
[4] Div Space Sci, Largo, MD 20774 USA
[5] USN, Res Lab, Div Space Sci, Washington, DC 20375 USA
基金
美国国家航空航天局;
关键词
extreme ultraviolet (EUV) photodiodes; silicon radiation detectors; ultraviolet detectors;
D O I
10.1109/TED.2005.862500
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Responsivity of silicon photodiodes was measured from -100 C to +50 C in the 3 to 250 nm wavelength range using synchrotron and laboratory radiation sources. Two types of silicon photodiodes were studied, the AXUV series having a thin nitrided silicon dioxide surface layer and the SXUV series having a thin metal silicide surface layer. Depending on the wavelength, the responsivity increases with temperature with the rates 0.013%/C to 0.053%/C for the AXUV photodiode and 0.020%/C to 0.084%/C for the SXUV photodiode. The increase in responsivity is consistent with the decrease in the silicon bandgap energy which causes a decrease in the pair creation energy. These results are particularly important for dose measurement in extreme ultraviolet (EUV) lithography steppers and sources since the detector temperature often increases because of the high EUV intensities involved.
引用
收藏
页码:218 / 223
页数:6
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