Transition-Metal Substitution Doping in Synthetic Atomically Thin Semiconductors

被引:247
作者
Gao, Jian [1 ]
Kim, Young Duck [2 ]
Liang, Liangbo [3 ,4 ]
Idrobo, Juan Carlos [4 ]
Chow, Phil [1 ]
Tan, Jiawei [1 ]
Li, Baichang [1 ]
Li, Lu [5 ]
Sumpter, Bobby G. [4 ]
Lu, Toh-Ming [3 ]
Meunier, Vincent [3 ]
Hone, James [2 ]
Koratkar, Nikhil [1 ,5 ]
机构
[1] Rensselaer Polytech Inst, Dept Mat Sci & Engn, 110 8th St, Troy, NY 12180 USA
[2] Columbia Univ, Dept Mech Engn, New York, NY 10027 USA
[3] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, 110 8th St, Troy, NY 12180 USA
[4] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA
[5] Rensselaer Polytech Inst, Dept Mech Aerosp & Nucl Engn, 110 8th St, Troy, NY 12180 USA
基金
美国国家科学基金会;
关键词
P-N-JUNCTIONS; MONOLAYER MOS2; MOLYBDENUM-DISULFIDE; TRANSPORT-PROPERTIES; RES2; NANOSHEETS; BILAYER MOS2; WS2; PHOTOLUMINESCENCE; HETEROSTRUCTURES; DICHALCOGENIDES;
D O I
10.1002/adma.201601104
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Large-area "in situ" transition-metal substitution doping for chemical-vapor-deposited semiconducting transition-metal-dichalcogenide monolayers deposited on dielectric substrates is demonstrated. In this approach, the transition-metal substitution is stable and preserves the monolayer's semiconducting nature, along with other attractive characteristics, including direct-bandgap photoluminescence.
引用
收藏
页码:9735 / +
页数:10
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