Microtexture and hardness of CVD deposited α-Al2O3 and TiCxN1-x coatings

被引：13

作者：

Chien, Harry ^{[1
]}

Gao, Michael C. ^{[1
]}

Miller, Herbert M. ^{[1
]}

Rohrer, Gregory S. ^{[1
]}

Ban, Zhigang ^{[2
]}

Prichard, Paul ^{[2
]}

Liu, Yixiong ^{[2
]}

机构：

[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA

[2] Kennametal Inc, Latrobe, PA 15650 USA

来源：

INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 2009年 / 27卷 / 02期

基金：

美国国家科学基金会;

关键词：

Coatings; Microstructure; Texture; Hardness; TEXTURE; MICROSTRUCTURE;

D O I：

10.1016/j.ijrmhm.2008.09.010

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The microstructures of chemical vapor deposited coatings on four tool inserts have been comprehensively characterized using electron backscatter diffraction mapping. Nanoindentation was used to measure the hardness of the TiCxN1-x, and alpha-Al2O3 layers in each coating. The TiCxN1-x layers have weak [112] or [101] textures in the growth direction and are highly twinned. In these layers, coherent twins make up 13%-20% of the total grain boundary length. The alumina layers have [10 (1) over bar4] or [0001] textures in the growth direction that are 4.2-8.8 times random. The hardest coatings consist of highly twinned TiCxN1-x layers with weak [112] texture and alpha-Al2O3 with strong [10 (1) over bar4] texture. (C) 2008 Elsevier Ltd. All rights reserved.

引用

页码：458 / 464

页数：7

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