Nickel nanoparticles and nanowires obtained by scanning probe lithography using point indentation technique

A lithographic method of obtaining metal nanowires and nanoparticles on solid substrates is proposed, which employs a polymer mask with windows for the metal deposition formed by indentation in an atomic force microscope. Using this method, Ni nanowires with a minimum width of 60 nm, thicknesses within 6-20 nm, and lengths up to 20 mu m and Ni nanoparticles with a preset ordered arrangement have been obtained on a SiO2 surface. The domain structure in obtained nanoobjects has been studied by the magnetic force microscopy technique.