Numerical study of hyperlenses for three-dimensional imaging and lithography

被引：13

作者：

Wan, Weiwei ^{[1
]}

Ponsetto, Joseph Louis ^{[1
]}

Liu, Zhaowei ^{[1
]}

机构：

[1] Univ Calif San Diego, Dept Elect & Comp Engn, San Diego, CA 92093 USA

来源：

OPTICS EXPRESS | 2015年 / 23卷 / 14期

基金：

美国国家科学基金会;

关键词：

OPTICAL HYPERLENS; DIFFRACTION-LIMIT; MICROSCOPY;

D O I：

10.1364/OE.23.018501

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The development of nanostructured metamaterials and the ability to engineer material dispersion has led to impressive advances in the diverse field of nanophotonics. Of interest to many is the enhanced ability to control, illuminate, and image with light on subwavelength scales. In this letter, we numerically demonstrate a hyperlens with unprecedented radial-resolution at 5 nm scale for both imaging and lithography applications. Both processes are shown to have accuracy that surpasses the Abbe diffraction limit in the radial direction, which has potential applications for 3D imaging and lithography. Design optimization is discussed with regards to several important hyperlens parameters. (C) 2015 Optical Society of America

引用

页码：18501 / 18510

页数：10

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