Influence of acoustic phonon confinement on electron mobility in ultrathin silicon on insulator layers

被引:30
作者
Donetti, L [1 ]
Gámiz, F [1 ]
Rodriguez, N [1 ]
Jimenez, F [1 ]
Sampedro, C [1 ]
机构
[1] Univ Granada, Dept Elect & Tecnol Comp, E-18071 Granada, Spain
关键词
D O I
10.1063/1.2187952
中图分类号
O59 [应用物理学];
学科分类号
摘要
We show the importance of acoustic phonon confinement in ultrathin silicon-on-insulator inversion layers by comparing electron mobility calculated by the Monte Carlo method assuming a bulk acoustic phonon model (the usual procedure) with that obtained by using a confined acoustic phonon model developed in this work. Both freestanding and rigid boundary conditions are taken into account for the evaluation of the confined phonon dispersion in a three-layer structure. Mobility reductions of 30% are observed for silicon thicknesses of around 5-10 nm when the confined acoustic phonon model is used.
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页数:3
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