Self-similarity and finite-size effects in nano-indentation of highly cross-linked polymers

被引:12
作者
Altebaeumer, T. [1 ]
Gotsmann, B. [1 ]
Knoll, A. [1 ]
Cherubini, G. [1 ]
Duerig, U. [1 ]
机构
[1] IBM Corp, Zurich Res Lab, CH-8803 Ruschlikon, Switzerland
关键词
D O I
10.1088/0957-4484/19/47/475301
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The scalability of thermomechanical polymer deformations in the sub-10 nm regime is of particular importance for nano-imprint techniques, hardness measurements of thin films by nano-indentations, and scanning-probe-based thermomechanical data storage. We investigate nano-indentation in the sub-10 nm regime performed on highly cross-linked polymer films of different thicknesses. It is shown that the lateral and vertical geometric characteristics of the indents independently scale down to an indent depth of 1 nm and that the scaling parameters are functions of the film thickness and the temperature of the indenter. However, in the limit of shallow indents the scaling of the cross-coupling between lateral and vertical dimensions is lost. It is argued that the breakdown of self-similarity is due to a minimum strain requirement originating from the co-operative nature of the polymer response induced by a transitions which lock the indent in the deformed state. The results shed new light on the fundamental processes and size effects involved in nanoscale plastic replication, in general.
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页数:11
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