Electronic transport and Schottky barrier heights of Ni/Au contacts on n-type GaN surface with and without a thin native oxide layer

被引:31
作者
Lin, YJ [1 ]
Lin, WX
Lee, CT
Chang, HC
机构
[1] Natl Changhua Univ Educ, Inst Photon, Changhua 500, Taiwan
[2] Natl Cheng Kung Univ, Inst Microelect, Dept Elect Engn, Tainan 701, Taiwan
[3] Feng Chia Univ, Dept Automat Control Engn, Taichung 407, Taiwan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 4A期
关键词
gaN; Schottky barrier height; thermionic field emission; thermionic emission; surface treatment;
D O I
10.1143/JJAP.45.2505
中图分类号
O59 [应用物理学];
学科分类号
摘要
Effects of a thin native oxide layer on Au/Ni/n-type GaN Schottky diodes were investigated in this study. The tunneling current was induced in the presence of native oxides on the GaN surface, making the thermionic emission (TE) theory inapplicable in this case. We find that the value of the barrier height (BH) calculated using the thermionic field emission (TFE) model is similar to that obtained by capacitance-voltage characteristics. This suggested that the discrepancy between BH according to the TFE and TE model for Au/Ni/n-type GaN Schottky diodes could be attributed to the presence of a native oxide layer at the Ni/n-type GaN interface and oxygen-induced and nitrogen-vacancy-related states on the GaN Surfaces. Further, the characteristics of Schottky diodes improved when the n-type GaN was treated with (NH4)(2)S-x solution, an effective agent for removing native oxides and reducing surface states.
引用
收藏
页码:2505 / 2508
页数:4
相关论文
共 26 条
[1]   Investigations of SiO2/n-GaN and Si3N4/n-GaN insulator-semiconductor interfaces with low interface state density [J].
Arulkumaran, S ;
Egawa, T ;
Ishikawa, H ;
Jimbo, T ;
Umeno, M .
APPLIED PHYSICS LETTERS, 1998, 73 (06) :809-811
[2]   Effects of interfacial oxides on Schottky barrier contacts to n- and p-type GaN [J].
Cao, XA ;
Pearton, SJ ;
Dang, G ;
Zhang, AP ;
Ren, F ;
Van Hove, JM .
APPLIED PHYSICS LETTERS, 1999, 75 (26) :4130-4132
[3]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+
[4]   SCHOTTKY-BARRIER ON N-TYPE GAN GROWN BY HYDRIDE VAPOR-PHASE EPITAXY [J].
HACKE, P ;
DETCHPROHM, T ;
HIRAMATSU, K ;
SAWAKI, N .
APPLIED PHYSICS LETTERS, 1993, 63 (19) :2676-2678
[5]   Pd/GaN Schottky diode with a barrier height of 1.5 eV and a reasonably effective Richardson coefficient [J].
Ishikawa, H ;
Nakamura, K ;
Egawa, T ;
Jimbo, T ;
Umeno, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (1AB) :L7-L9
[6]   Gain mechanism in GaN Schottky ultraviolet detectors [J].
Katz, O ;
Garber, V ;
Meyler, B ;
Bahir, G ;
Salzman, J .
APPLIED PHYSICS LETTERS, 2001, 79 (10) :1417-1419
[7]  
KHAN MA, 1993, I PHYS C SER, V137, P519
[8]   Formation processes and properties of Schottky and ohmic contacts on n-type GaN for field effect transistor applications [J].
Koyama, Y ;
Hashizume, T ;
Hasegawa, H .
SOLID-STATE ELECTRONICS, 1999, 43 (08) :1483-1488
[9]   Schottky barrier height and surface state density of Ni/Au contacts to (NH4)2Sx-treated n-type GaN [J].
Lee, CT ;
Lin, YJ ;
Liu, DS .
APPLIED PHYSICS LETTERS, 2001, 79 (16) :2573-2575
[10]   Low resistive ohmic contact formation on surface treated-n-GaN alloyed at low temperature [J].
Lin, YJ ;
Lee, HY ;
Hwang, FT ;
Lee, CT .
JOURNAL OF ELECTRONIC MATERIALS, 2001, 30 (05) :532-537