Interactions of C in layered Mo-Si structures

被引：7
|
作者：
Bosgra, J. [1 ]
Veldhuizen, L. W. [1 ]
Zoethout, E. [1 ]
Verhoeven, J. [2 ]
Loch, R. A. [1 ]
Yakshin, A. E. [1 ]
Bijkerk, F. [1 ,3 ]
机构：
[1] Dutch Inst Fundamental Energy Res, FOM Inst DIFFER, NL-3439 MN Nieuwegein, Netherlands
[2] Leiden Univ, Leiden Inst Phys, Leiden, Netherlands
[3] Univ Twente, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands
来源：
THIN SOLID FILMS | 2013年 / 542卷
关键词：
Nanoscale interdiffusion; Thermal stability; Mo/Si multilayer mirror; MO/SI MULTILAYERS; THERMAL-STABILITY; CARBIDE; MIRRORS; DIFFUSION; CONTACTS; GROWTH;
D O I：
10.1016/j.tsf.2013.06.082
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Interdiffusion of a few nanometers thick C layer with Mo and Si under annealing at a temperature of 600 degrees C was studied using X-ray photoelectron spectroscopy sputter depth profiling. A strong diffusion asymmetry of C in a Mo-Si layered structure is observed. C does interdiffuse with Mo, however, even at 600 degrees C, no interdiffusion of Si and C was observed. Based on these results, the thermal stability of Mo/Si-based layer structures was improved by depositing a Si/C/Mo2C/C/Si layer structure. This structure shows superior thermal stability at 600 degrees C compared to the Mo2C/Si and Mo/Si layer structure. (C) 2013 The Authors. Published by Elsevier B.V. All rights reserved.
引用
收藏
页码：210 / 213
页数：4
相关论文
共 50 条
  • [1] Study of roughness in multilayer Mo-Si mirrors
    Valkovskiy, G. A.
    Baidakova, M. V.
    Brunkov, P. N.
    Konnikov, S. G.
    Yagovkina, M. A.
    Zadiranov, Ju. M.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2011, 208 (11): : 2623 - 2628
  • [2] Graded PVD Mo-Si interlayer between Si coating and Mo-Si-B alloys: Investigation of oxidation behaviour
    Anton, Ronja
    Huning, Steffen
    Laska, Nadine
    Weber, Matthias
    Schellert, Steven
    Gorr, Bronislava
    Christ, Hans-Jurgen
    Schulz, Uwe
    CORROSION SCIENCE, 2021, 192
  • [3] Thermal stability and mechanical properties of boron enhanced Mo-Si coatings
    Riedl, H.
    Vieweg, A.
    Limbeck, A.
    Kalas, J.
    Arndt, M.
    Polcik, P.
    Euchner, H.
    Bartosik, M.
    Mayrhofer, P. H.
    SURFACE & COATINGS TECHNOLOGY, 2015, 280 : 282 - 290
  • [4] Reaction temperatures within Mo-Si powder mixtures and their influencing factors
    Wiltner, A.
    Kloeden, B.
    Weissgaerber, T.
    Hutsch, T.
    Kieback, B.
    INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS, 2013, 37 : 73 - 81
  • [5] THERMAL-STABILITY OF SOFT-X-RAY MO-SI AND MOSI2-SI MULTILAYER MIRRORS
    KONDRATENKO, VV
    PERSHIN, YP
    POLTSEVA, OV
    FEDORENKO, AI
    ZUBAREV, EN
    YULIN, SA
    KOZHEVNIKOV, IV
    SAGITOV, SI
    CHIRKOV, VA
    LEVASHOV, VE
    VINOGRADOV, AV
    APPLIED OPTICS, 1993, 32 (10): : 1811 - 1816
  • [6] Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth
    Bosgra, J.
    Verhoeven, J.
    van de Kruijs, R. W. E.
    Yakshin, A. E.
    Bijkerk, F.
    THIN SOLID FILMS, 2012, 522 : 228 - 232
  • [7] Ion bombardment effects on nucleation of sputtered Mo nano-crystals in Mo/B4C/Si multilayers
    Patelli, A.
    Rigato, V.
    Salmaso, G.
    Carvalho, N. J. M.
    De Hosson, J. Th. M.
    Bontempi, E.
    Depero, L. E.
    SURFACE & COATINGS TECHNOLOGY, 2006, 201 (1-2) : 143 - 147
  • [8] Study on reaction and diffusion in the Mo-Si system by ZrO2 marker experiments
    Byun, JY
    Yoon, JK
    Kim, GH
    Kim, JS
    Choi, CS
    SCRIPTA MATERIALIA, 2002, 46 (07) : 537 - 542
  • [9] CrB2 diffusion barriers for Mo/Si multilayer structures
    Pershyn, Y. P.
    Gullikson, E. M.
    Artyukov, I. A.
    Kondratenko, V. V.
    Voronov, D. L.
    Devizenko, A. Yu
    Vinogradov, A. V.
    Fedorenko, A. I.
    MATERIALS RESEARCH EXPRESS, 2019, 6 (05):
  • [10] Chemical interactions at interfaces in nanoscale Mo/B4C multilayered structures
    Sakhonenkov, S. S.
    Bugaev, A. V.
    Shaposhnikov, R. A.
    Polkovnikov, V. N.
    Filatova, E. O.
    SURFACES AND INTERFACES, 2024, 55
12345