Current status of resistive nonvolatile memories

被引:14
|
作者
Lin, Chih-Yang [1 ,2 ,3 ]
Liu, Chih-Yi [1 ,2 ,3 ]
Lin, Chun-Chieh [1 ,2 ,3 ]
Tseng, T. Y. [1 ,2 ,3 ]
机构
[1] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan
[3] Natl Taipei Univ Technol, Dept Mat & Mineral Resources Engn, Taipei 106, Taiwan
关键词
Nonvolatile memories; Resistance random access memory (RRAM); Perovskite oxides; Transition metal oxides; Molecular materials;
D O I
10.1007/s10832-007-9081-y
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Several emerging nonvolatile memories (NVMs) such as ferroelectric memory, magnetoresistive rams and ovonic universal memory are being developed for possible applications. Resistive random access memory (RRAM) is another interesting competitor in the class of NVMs. The RRAM is based on a large change in electrical resistance when the memory film is exposed to voltage or current pulses, and can keep high or low resistance states without any power. The ideal RRAM Should have the superior properties of reversible switching, long retention tune, multilevel switching, simple structure, small size, and low operating voltage. Perovskite oxides, transition metal oxides, and molecular materials were found to have resistive memory properties. This presentation reviews the ongoing research and development activities on future resistance NVMs technologies incorporating these new memory materials. The possible basic mechanisms for their bistable resistance switching are described. The effect of processing, composition, and structure on the properties of resistive memory materials and consequently the devices are discussed.
引用
收藏
页码:61 / 66
页数:6
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