Universal Method for the Fabrication of Detachable Ultrathin Films of Several Transition Metal Oxides

被引:36
|
作者
Singh, Sherdeep [1 ]
Festin, Miguel [1 ]
Barden, Warren R. T. [1 ]
Xi, Luan [2 ]
Francis, James T. [2 ]
Kruse, Peter [1 ]
机构
[1] McMaster Univ, Dept Chem, Hamilton, ON L8S 4M1, Canada
[2] Univ Western Ontario, Western Sci Ctr, London, ON N6A 5B7, Canada
关键词
porosity; detachable; anodization; thin membranes; ion migration; etching; metal oxides;
D O I
10.1021/nn800488h
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Ultrathin films are important nanoscale structures that are used extensively in a variety of technological contexts. However, it has traditionally been difficult and costly to fabricate detachable and purely inorganic high aspect ratio films with controlled thickness and good uniformity. Here we report a versatile method to make separable purely inorganic membranes of various metal oxides such as Nb2O5, TiO2, WO3, and Ta2O5, with thicknesses ranging from 30 to 150 nm. Fluoride ions are migrated through the oxide film and upon arrival at the oxide-metal interface form a sacrificial soluble oxyfluoride layer. Fluorine also plays a role in controlling the porosity of the films. The study exposes the mechanism behind the detachment process that is largely due to the fast migration of fluoride anions relative to oxygen anions. The resulting films have a wide range of potential applications as catalysts or catalyst supports, filtration membranes, sensors, and more.
引用
收藏
页码:2363 / 2373
页数:11
相关论文
共 50 条
  • [1] PHOTOELECTROCHEMICAL EFFECT ON SEVERAL TRANSITION-METAL OXIDES
    CLECHET, P
    MARTIN, JR
    OLIER, R
    VALLOUY, C
    COMPTES RENDUS HEBDOMADAIRES DES SEANCES DE L ACADEMIE DES SCIENCES SERIE C, 1976, 282 (18): : 887 - 890
  • [2] Fabrication of plasmonic gold-nanoparticle-transition metal oxides thin films for optoelectronic applications
    Kumar, Neetesh
    Lee, Hock Beng
    Hwang, Sunbin
    Kim, Tae-Wook
    Kang, Jae-Wook
    JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 775 : 39 - 50
  • [3] Transition Metal Induced Crystallization of Ultrathin Silica Films
    Li, Linfei
    Tissot, Heloise
    Shaikhutdinov, Shamil
    Freund, Hans Joachim
    CHEMISTRY OF MATERIALS, 2017, 29 (03) : 931 - 934
  • [4] Lighting up ultrathin transition metal dichalcogenide films
    不详
    AMERICAN CERAMIC SOCIETY BULLETIN, 2017, 96 (02): : 20 - 20
  • [5] Unidirectional anisotropy in ultrathin transition-metal films
    Skomski, R
    Oepen, HP
    Kirschner, J
    PHYSICAL REVIEW B, 1998, 58 (17): : 11138 - 11141
  • [6] Smoothing of ultrathin silver films by transition metal seeding
    Anders, Andre
    Byon, Eungsun
    Kim, Dong-Ho
    Fukuda, Kentaro
    Lim, Sunnie H. N.
    SOLID STATE COMMUNICATIONS, 2006, 140 (05) : 225 - 229
  • [7] PREPARATION AND CHARACTERIZATION OF SEVERAL CONDUCTING TRANSITION-METAL OXIDES
    WOLD, A
    DWIGHT, K
    HIGH TEMPERATURE SUPERCONDUCTORS : RELATIONSHIPS BETWEEN PROPERTIES, STRUCTURE, AND SOLID-STATE CHEMISTRY, 1989, 156 : 3 - 12
  • [8] Universal interface engineering method for applying transition metal oxides in silicon heterojunction solar cell
    Cao, Liqi
    Procel, Paul
    Zhao, Yifeng
    Yan, Jin
    Ozkol, Engin
    Kovacevic, Katarina
    Zeman, Miro
    Mazzarella, Luana
    Isabella, Olindo
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2024, 278
  • [9] Integrated films of transition metal oxides for information technology
    Demkov, Alexander A.
    Ponath, Patrick
    Fredrickson, Kurt
    Posadas, Agham B.
    McDaniel, Martin D.
    Ngo, Thong Q.
    Ekerdt, John G.
    MICROELECTRONIC ENGINEERING, 2015, 147 : 285 - 289
  • [10] Shock-induced phase transition of MnO and several other transition metal oxides
    Syono, Y
    Noguchi, Y
    Fukuoka, K
    Kusaba, K
    Atou, T
    SHOCK COMPRESSION OF CONDENSED MATTER - 1997, 1998, 429 : 151 - 154