Multi-layer inverse design of vertical grating couplers for high-density, commercial foundry interconnects

被引:27
作者
Hammond, Alec M. [1 ]
Slaby, Joel B. [1 ]
Probst, Michael J. [1 ]
Ralph, Stephen E. [1 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30308 USA
基金
美国国家科学基金会;
关键词
TOPOLOGY OPTIMIZATION; SILICON; EFFICIENCY; PHOTONICS; SCALE;
D O I
10.1364/OE.466015
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Density-based topology optimization is used to design large-scale, multi-layer grating couplers that comply with commercial foundry fabrication constraints while simultaneously providing beam profiles that efficiently couple to a single-mode optical fiber without additional optics. Specifically, we describe the design process and experimentally demonstrate both single- and dual-polarization grating couplers that couple at normal incidence (0 degrees from the normal) with low backreflections (-13.7 dB and -15.4 dB at the center wavelength), broad 3 dB bandwidths (75 nm and 89 nm), and standard coupling efficiencies (-4.7 dB and -7.0 dB). The dual-polarization grating couplers exhibit over 30 dB of polarization extinction across the entire band. The devices were fabricated on the GlobalFoundries 45CLO CMOS platform and characterized across three separate wafers. This new design approach produces distinct features for multiple foundry layers and yields emitters with arbitrary, user-specified far-field profiles. (C) 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
引用
收藏
页码:31058 / 31072
页数:15
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