Strain-induced diffuse dielectric anomaly and critical point in perovskite ferroelectric thin films

被引:79
作者
Tagantsev, AK [1 ]
Pertsev, NA
Muralt, P
Setter, N
机构
[1] Ecole Polytech Fed Lausanne, Lab Ceram, CH-1015 Lausanne, Switzerland
[2] Russian Acad Sci, AF Ioffe Physicotech Inst, St Petersburg 194021, Russia
来源
PHYSICAL REVIEW B | 2002年 / 65卷 / 01期
关键词
D O I
10.1103/PhysRevB.65.012104
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
It is shown that a strong but diffuse dielectric anomaly, commonly expected only in disordered ferroelectrics, may be inherent in strained and defect-free perovskite ferroelectric thin films. The origin of this unusual anomaly, which was never predicted for a defect-free system, is the overcritical trace of a critical point in the film phase diagram, This possibility is illustrated by the mean-field thermodynamic calculations performed for (111)-oriented PbTiO3 films epitaxially grown on dissimilar cubic substrates. It is shown that clear symmetry reasons exist for the unusual behavior of the system. The essential prediction of the theory is that the type of the dielectric anomaly can be tailored by the sign of the misfit strain imposed on the film in paraelectric state: compressive strain leads to a standard Curie-Weiss anomaly, whereas the tensile one results in a diffuse anomaly.
引用
收藏
页码:121041 / 121044
页数:4
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