Study on the perfection of in situ P-injection synthesis LEC-InP single crystals

被引:12
作者
Zhou, XL
Zhao, YW
Sun, NF
Yang, GY
Xu, YQ
Sun, TN
机构
[1] Hebei Semicond Res Inst, Hebei 050051, Peoples R China
[2] Chinese Acad Sci, Inst Semicond, Ctr Mat Sci, Beijing 100083, Peoples R China
基金
中国国家自然科学基金;
关键词
etch-pit density; phosphorus-rich; PL-mapping; indium phosphide;
D O I
10.1016/j.jcrysgro.2003.12.042
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Undoped, S-doped and Fe-doped InP crystals with diameter up to 4-inch have been pulled in drop 10 0 drop -direction under P-rich condition by a rapid P-injection in situ synthesis liquid encapsulated Czochralski (LEC) method. High speed photoluminescence mapping, etch-pit density (EPD) mapping and scanning electron microscopy have been used to characterize the samples of the single crystal ingots. Dislocations and electrical homogeneity of these samples are investigated and compared. By controlling the thermal field and the solid-liquid interface shape, 4-inch low-EPD InP single crystals have been successfully grown by the rapid P-injection synthesis LEC method. The EPD across the wafer of the ingots is less than 5 x 10(4) cm(-2). Cluster defects with a pore center are observed in the P-rich LEC grown InP ingots. These defects are distributed irregularly on a wafer and are surrounded by a high concentration of dislocations. The uniformity of the PL intensity across the wafer is influenced by these defects. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:17 / 20
页数:4
相关论文
共 9 条
[1]   EVIDENCE FOR LOW SURFACE RECOMBINATION VELOCITY ON N-TYPE INP [J].
CASEY, HC ;
BUEHLER, E .
APPLIED PHYSICS LETTERS, 1977, 30 (05) :247-249
[3]   METALLOGRAPHIC DEVELOPMENT OF CRYSTAL DEFECTS IN INP [J].
HUBER, A ;
LINH, NT .
JOURNAL OF CRYSTAL GROWTH, 1975, 29 (01) :80-84
[4]   BRIDGMAN-TYPE APPARATUS FOR THE STUDY OF GROWTH-PROPERTY RELATIONSHIPS - ARSENIC VAPOR-PRESSURE GAAS PROPERTY RELATIONSHIP [J].
PARSEY, JM ;
NANISHI, Y ;
LAGOWSKI, J ;
GATOS, HC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (02) :388-393
[5]  
SHIMIZU A, 2001, J CRYST GROWTH, V119, P229
[6]  
Sun NF, 2001, SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS, P267, DOI 10.1109/ICSICT.2001.981470
[7]  
SUN NF, 2002, P IND PHOSPH REL MAT, P401
[8]  
TONGNIEN S, 1982, P 2 C SEM 3 5 MAT EV, P61
[9]  
WANG SY, 2001, COMPOUND SEMICONDUCT, V7, P68