All dielectric hard x-ray mirror by atomic layer deposition

被引：19
作者：
Szeghalmi, Adriana [1 ]
Senz, Stephan [1 ]
Bretschneider, Mario [2 ]
Goesele, Ulrich [1 ]
Knez, Mato [1 ]
机构：
[1] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany
[2] IFG Inst Sci Instruments GmbH, D-12489 Berlin, Germany
来源：
APPLIED PHYSICS LETTERS | 2009年 / 94卷 / 13期
关键词：
aluminium compounds; atomic force microscopy; atomic layer deposition; dielectric thin films; mirrors; nanostructured materials; tantalum compounds; transmission electron microscopy; X-ray diffraction; X-ray optics; X-ray reflection;
D O I：
10.1063/1.3114402
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Mirrors consisting of Al2O3 and Ta2O5 (similar to 2 nm film thickness) nanolaminates for hard x-ray wavelengths were produced by atomic layer deposition and characterized. Atomic force microscopy and transmission electron microscopy (TEM) proved extremely smooth surfaces of the mirrors, which are critical for highest reflectance. TEM images showed sharp interfaces between the oxides. The experimental x-ray reflectivity data were theoretically modeled and indicated minimal random thickness variations in the individual layers. Additionally, a depth graded sample with a total thickness of similar to 4 mu m for focusing applications in transmission (Laue) geometry and capillaries was coated.
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页数：3
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