Elastic scattering of electrons by silicon, germanium and tin tetrahalides

被引：3

作者：

Verma, Pankaj ^{[1
]}

Antony, Bobby ^{[1
]}

机构：

[1] Indian Sch Mines, Indian Inst Technol, Dept Appl Phys, Atom & Mol Phys Lab, Dhanbad 826004, Jharkhand, India

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2018年 / 222卷

关键词：

Electron collision; Elastic scattering; Tetrahalides; CROSS-SECTION; MOLECULES; SICL4; PLASMAS; ATOMS; SIH4;

D O I：

10.1016/j.elspec.2017.09.005

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

This article reports the elastic collision cross section for the tetrahedral compounds of silicon, germanium and tin by intermediate to high energy (20-5000 eV) electrons. The calculations were carried out using a quantum mechanical approach called spherical complex optical potential (SCOP) formalism. Under the same frame work the total scattering cross section has been also studied. Among the studied molecules, the total scattering cross sections for SiCl4 and GeCl4 by electrons has been compared with available experimental values. For all other molecules the elastic and total cross sections are reported for the first time. We have also investigated the halogenation effect by comparing the ratio of cross sections for different halides. (C) 2017 Elsevier B.V. All rights reserved.

引用

页码：51 / 56

页数：6

共 18 条

[1] Characterization of SiCl4/N2 plasmas
Agarwal, AS
Berry, V
Alapati, R
Nordheden, KJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2005, 152 (03) : G210 - G212
[2] [Anonymous], INTERACTIONS PHOTO C
[3] Computation of electron-impact total and differential cross sections for allene (C3H4) in the energy range 0.1-2000 eV
Barot, Avani
Gupta, Dhanoj
Vinodkumar, Minaxi
Antony, Bobby
[J]. PHYSICAL REVIEW A, 2013, 87 (06):
[4] ELASTIC ELECTRON SCATTERING AMPLITUDES FOR NEUTRAL ATOMS CALCULATED USING PARTIAL WAVE METHOD AT 10 40 70 AND 100 KV FOR Z=1 TO Z=54
COX, HL
BONHAM, RA
[J]. JOURNAL OF CHEMICAL PHYSICS, 1967, 47 (08) : 2599 - &
[5] A modified additivity rule for the calculation of electron impact ionization cross-section of molecules ABn
Deutsch, H
Becker, K
Mark, TD
[J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 1997, 167 : 503 - 517
[6] Low bias reactive ion etching of GaAs with a SiCl4/N2/O2 time-multiplexed process
Golka, S.
Schartner, S.
Schrenk, W.
Strasser, G.
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (03): : 839 - 844
[7] SCATTERING OF SLOW ELECTRONS BY HYDROGEN MOLECULES
HARA, S
[J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1967, 22 (03) : 710 - &
[8] TOTAL (ELASTIC PLUS INELASTIC) CROSS-SECTIONS FOR ELECTRON-SCATTERING FROM DIATOMIC AND POLYATOMIC-MOLECULES AT 10-EV-5000-EV - H2, LI2, HF, CH4, N2, CO, C2H2, HCN, O2, HCL, H2S, PH3, SIH4, AND CO2
JAIN, A
BALUJA, KL
[J]. PHYSICAL REVIEW A, 1992, 45 (01): : 202 - 218
[9] Electron-scattering studies of carbonyl fluoride
Kaur, Jaspreet
Mason, Nigel
Antony, Bobby
[J]. PHYSICAL REVIEW A, 2015, 92 (05):
[10] Lide D.R., 2004, CRC Handbook of Chemistry and Physics, Internet Version 2005, V85

← 1 2 →