Imaging Application tools for extremely low-k1 ArF immersion lithography

被引：7

作者：

Mori, Shinichi ^{[1
]}

Aoyama, Hajime ^{[1
]}

Ogata, Taro ^{[1
]}

Matsui, Ryota ^{[1
]}

Matsuyama, Tomoyuki ^{[1
]}

机构：

[1] Nikon Inc, Kumagaya, Saitama 3608559, Japan

来源：

OPTICAL MICROLITHOGRAPHY XXVI | 2013年 / 8683卷

关键词：

Immersion lithography; computational lithography; imaging application tools; SMO; overlay; freeform illumination; thermal aberration;

D O I：

10.1117/12.2011382

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The k1 factor continues to be driven downward in ArF immersion lithography, even below its limit from optical theory, using various lithographic techniques such as combination of Source and Mask Optimization (SMO) and multiple patterning. Such a low k1 factor tends to lead to extremely high sensitivity tp imaging parameters such as aberrations, distortion, illumination pupilgram shape, dose, focus, etc. Therefore, fast, precise and stable settings of these parameters are crucial to make such hyper low k1 lithography practical. We introduce various kinds of imaging application tools and technique, which we have been developing, to support the imaging parameter settings and control. The application tools cover illumination pupilgram adjustment for freeform illumination, automatic aberration control, and thermal aberration parameter settings.

引用

页数：9