Effect of Ion Beam Energy on Density, Roughness & Uniformity of Co Film Deposited using Ion Beam Sputtering System

Cobalt (Co) films were prepared, using ion beam sputtering technique. Films were prepared by varying beam voltage from 700 to 1100 V at room temperature. The influence of ion beam energy on the density, surface roughness and thickness uniformity of Co film was investigated. X-ray reflectivity study shows that surface roughness of film decreases with increasing beam energy and lowest surface roughness of 1.3 angstrom was achieved for 1000 V beam voltage at 4 cm(3)/min Ar gas flow. The density of the film was 93 % of bulk density of Co. These ultra low roughness films are very promising for studying the magnetic properties of Co films.