Defect-free periodic structures using extreme ultraviolet Talbot lithography in a table-top system

被引：8
|
作者：
Li, Wei [1 ,2 ]
Esquiroz, Victor Martinez [1 ,2 ]
Urbanski, Lukasz [1 ,2 ]
Patel, Dinesh [1 ,2 ]
Menoni, Carmen S. [1 ,2 ]
Marconi, Mario C. [1 ,2 ]
Stein, Aaron [3 ]
Chao, Weilun [4 ]
Anderson, Erik H. [4 ]
机构：
[1] Colorado State Univ, Engn Res Ctr Extreme Ultraviolet Sci & Technol, Ft Collins, CO 80523 USA
[2] Colorado State Univ, Elect & Comp Engn Dept, Ft Collins, CO 80523 USA
[3] Brookhaven Natl Lab, Ctr Funct Nanomat, Upton, NY 11973 USA
[4] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Ctr Xray Opt, Berkeley, CA 94720 USA
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2013年 / 31卷 / 06期
基金：
美国国家科学基金会;
关键词：
X-RAY LASER; ENHANCED RAMAN-SCATTERING; COHERENT DIFFRACTION LITHOGRAPHY; INTERFEROMETRIC LITHOGRAPHY; INTERFERENCE LITHOGRAPHY; WAVELENGTH RESOLUTION; PHOTONIC CRYSTALS; REPETITION RATE; LARGE-AREA; FABRICATION;
D O I：
10.1116/1.4826344
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A compact nanofabrication system that combines Talbot lithography and a table-top extreme ultraviolet laser is presented. The lithographic method based on the Talbot effect provides a robust and simple experimental setup that is capable to print periodic structures over millimeter square areas free of defects. Test structures were printed and transferred into metal layers showing a complete coherent extreme ultraviolet lithographic process in a table-top system. (C) 2013 American Vacuum Society.
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收藏
页数：7
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