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Characterization and Investigation of a Hot-Carrier Effect in Via-Contact Type a-InGaZnO Thin-Film Transistors
被引:7
|作者:
Hsieh, Tien-Yu
[1
]
Chang, Ting-Chang
[1
,2
]
Chen, Yu-Te
[3
]
Liao, Po-Yung
[1
]
Chen, Te-Chih
[1
]
Tsai, Ming-Yen
[3
]
Chen, Yu-Chun
[1
]
Chen, Bo-Wei
[3
]
Chu, Ann-Kuo
[3
]
Chou, Cheng-Hsu
[4
]
Chung, Wang-Cheng
[4
]
Chang, Jung-Fang
[4
]
机构:
[1] Natl Sun Yat Sen Univ, Dept Phys, Kaohsiung 80424, Taiwan
[2] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Tainan 70101, Taiwan
[3] Natl Sun Yat Sen Univ, Dept Photon, Kaohsiung 80424, Taiwan
[4] Chimei Innolux Corp, Prod Technol Ctr, Tainan 350, Taiwan
关键词:
Dual gate;
hot-carrier;
indium gallium zinc oxide (IGZO);
thin-film transistors (TFTs);
via-contact;
D O I:
10.1109/TED.2013.2253611
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
Electrical characteristics and the effect of hot-carriers are investigated in via-contact-type a-InGaZnO thin-film transistors. Current-voltage as well as capacitance-voltage measurements are utilized to investigate the impact of top gate bias on device characteristics as well as degradation behaviors caused by a hot-carrier stress. It is found that the redundant source/drain electrodes in via-contact type devices can screen the electric field established by a top gate bias and have significant influence on the device characteristics. Hot-carrier stress brings about electron trapping in the etch stop layer below the redundant electrodes, and this is further verified through modulating the energy band structure by applying a top gate bias during the capacitance-voltage measurement.
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页码:1681 / 1688
页数:8
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