Erroneous p-type assignment by Hall effect measurements in annealed ZnO films grown on InP substrate

被引:15
作者
Macaluso, R. [1 ]
Mosca, M. [1 ]
Cali, C. [1 ]
Di Franco, F. [2 ]
Santamaria, M. [2 ]
Di Quarto, F. [2 ]
Reverchon, J. -L. [3 ]
机构
[1] Univ Palermo, Thin Films Lab, Dept Energy Informat Engn & Math Models DEIM, I-90128 Palermo, Italy
[2] Univ Palermo, Electrochem Mat Sci Lab, Dept Civil Environm Aerosp & Mat Engn DICAM, I-90128 Palermo, Italy
[3] Thales Res & Technol, F-91767 Palaiseau, France
关键词
THIN-FILMS; DEPOSITION; DIFFUSION; ACTIVATION; STATE;
D O I
10.1063/1.4803080
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on incorrect carrier type identification achieved by Hall effect measurements performed on ZnO films grown by pulsed laser deposition on InP substrates and subsequently annealed for 1 h at 600 degrees C in air. While Hall measurements, after post-growth annealing, reveal a change in the electrical properties of the films, from n-type to p-type, both photocurrent-based and standard C-V measurements performed on the same samples show no change in the native n-type doping of the ZnO films. A possible interpretation of the two results is reported. In particular, p-type conductivity observed by Hall effect may be ascribed to a highly conductive thin layer formed during the annealing process at the ZnO/InP interface, which dominates the Hall effect measurements and does not influence the photo-electrochemical behavior of ZnO as well as the measured differential capacitance. The conflicting results here reported show that for this kind of samples, Hall effect measurement can be misleading with respect to the real nature of the analyzed material, instead both C-V and photocurrent-based characterization techniques are more reliable and therefore could be alternatively used when particularly ambiguous results are expected by Hall effect measurements. (C) 2013 AIP Publishing LLC.
引用
收藏
页数:7
相关论文
共 38 条
[1]  
[Anonymous], 2008, HDB CHEM PHYS
[2]   Causes of incorrect carrier-type identification in van der Pauw-Hall measurements [J].
Bierwagen, Oliver ;
Ive, Tommy ;
Van de Walle, Chris G. ;
Speck, James S. .
APPLIED PHYSICS LETTERS, 2008, 93 (24)
[3]   Nd:YVO4 crystalline film grown by pulsed laser deposition [J].
Cali, C. ;
Cornacchia, F. ;
Di Lieto, A. ;
Marchetti, F. ;
Tonelli, M. .
OPTICAL MATERIALS, 2009, 31 (09) :1331-1333
[4]   In situ monitoring of pulsed laser indium-tin-oxide film deposition by optical emission spectroscopy [J].
Calì, C ;
Macaluso, R ;
Mosca, M .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2001, 56 (06) :743-751
[5]   Recent Advances in ZnO-Based Light-Emitting Diodes [J].
Choi, Yong-Seok ;
Kang, Jang-Won ;
Hwang, Dae-Kue ;
Park, Seong-Ju .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2010, 57 (01) :26-41
[6]   THE CHARGE DISTRIBUTION AT THE ZINC OXIDE-ELECTROLYTE INTERFACE [J].
DEWALD, JF .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1960, 14 :155-161
[7]  
Di Quarto F, 2009, MOD ASP ELECTROCHEM, P231, DOI 10.1007/978-0-387-92263-8_4
[8]   ZnO nanostructures for optoelectronics: Material properties and device applications [J].
Djurisic, A. B. ;
Ng, A. M. C. ;
Chen, X. Y. .
PROGRESS IN QUANTUM ELECTRONICS, 2010, 34 (04) :191-259
[9]   ZnO thin film formation on Si(111) by laser ablation of Zn target in oxygen atmosphere [J].
Fan, XM ;
Lian, JS ;
Guo, ZX ;
Lu, HJ .
JOURNAL OF CRYSTAL GROWTH, 2005, 279 (3-4) :447-453
[10]   An experimental investigation of Zn diffusion into InP and InGaAs [J].
He, SX ;
Zhao, YL .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2005, 20 (02) :149-151