Crystalline SrBi4Ti4O15 Thin Films on Amorphous Substrates Sputtered by rf Sputtering

Crystalline SrBi4Ti4O15 (SBTi) thin films were successfully deposited on amorphous fused silica substrates using rf sputtering technique. Homogeneous and crystallized films were obtained by optimizing the deposition and annealing conditions. The structural, morphological and optical properties of the films were investigated. As deposited films are amorphous in nature but crystallized on annealing at 600 degrees C. AFM reveals the fine grain morphology on annealing. The refractive index and optical band gap of the films are ranged between 1.7-2 and 3.4-3.15eV respectively.