An i-line molecular glass photoresist for high resolution patterning

被引：5

作者：

Liu, Juan ^{[1
]}

Wei, Qi ^{[1
]}

Wang, Liyuan ^{[1
]}

机构：

[1] Beijing Normal Univ, Coll Chem, Beijing 100875, Peoples R China

来源：

RSC ADVANCES | 2013年 / 3卷 / 48期

关键词：

NEAR-FIELD LITHOGRAPHY; RESIST; DIAZONAPHTHOQUINONE; NANOLITHOGRAPHY; CYCLODEXTRIN; FABRICATION; DESIGN;

D O I：

10.1039/c3ra45130e

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Calix[4]resorcinarene was functionalized by photoactive 2-diazo-1-naphthoquinone-4-sulfonyl chloride (2,1,4-DNQ-Cl) to form a single-component non-chemically amplified i-line molecular glass photoresist. This single-component molecular glass photoresist afforded clean 100 nm line patterns with i-line interference lithography.

引用

页码：25666 / 25669

页数：4

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