Device Improvement and Circuit Performance Evaluation of complete SiGe Double Gate Tunnel FETs

被引:0
作者
Ghosh, Bahniman [1 ]
Mishra, Rahul [1 ]
机构
[1] Indian Inst Technol, Dept Elect Engn, Kanpur 208016, Uttar Pradesh, India
来源
16TH INTERNATIONAL WORKSHOP ON PHYSICS OF SEMICONDUCTOR DEVICES | 2012年 / 8549卷
关键词
MOSFET; TFET; Extended Channel TFET; SiGe; TRANSISTOR;
D O I
10.1117/12.927346
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In recent past extensive simulation work on Tunnel Field Effect Transistors (TFETs) has already been done. However this is limited to device performance analysis. Evaluation of circuit performance is a topic that is very little touched. This is due to the non availability of compact models of TFETs in the commercial simulator. We generate the TFET model by using the model editor in Cadence OrCAD V16.0. In this paper for the first time we perform the circuit analysis of Extended Channel Tunnel Field Effect Transistors (Extended Channel TFETs), we test them over basic digital circuit. Before that we perform device analysis of double gate extended channel TFETs, extended channel has been tried before on SOI TFETs, we try it for the first time on double gate Si1-xGex TFETs. We even look at the effect of introducing Si layer. The performance of this device is compared for different Ge mole fraction and also with MOSFETs.
引用
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页数:12
相关论文
共 17 条
  • [1] Evaluation of barrier height and thickness in tunneling junctions by numerical calculation on tunnel probability
    Arakawa, N
    Otaka, Y
    Shiiki, K
    [J]. THIN SOLID FILMS, 2006, 505 (1-2) : 67 - 70
  • [2] P-channel tunnel field-effect transistors down to sub-50 nm channel lengths
    Bhuwalka, KK
    Born, M
    Schindler, M
    Schmidt, M
    Sulima, T
    Eisele, I
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (4B): : 3106 - 3109
  • [3] Performance enhancement of vertical tunnel field-effect transistor with SiGe in the δp+ layer
    Bhuwalka, KK
    Schulze, J
    Eisele, T
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (7A): : 4073 - 4078
  • [4] Born Mathias, 2006, P 25 INT C MICR 14 1
  • [5] Length scaling of the Double Gate Tunnel FET with a high-K gate dielectric
    Boucart, Kathy
    Ionescu, Adrian Mihai
    [J]. SOLID-STATE ELECTRONICS, 2007, 51 (11-12) : 1500 - 1507
  • [6] Boucart K, 2006, PROC EUR S-STATE DEV, P383
  • [7] Double-gate tunnel FET with high-κ gate dielectric
    Boucart, Kathy
    Mihai Ionescu, Adrian
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 2007, 54 (07) : 1725 - 1733
  • [8] Ioffe Physico-Technical Institute, EL ARCH NEW SEM MAT
  • [9] Kim D., 2009, ISLPED 09 AUG 2009 S
  • [10] Mayer F., EL DEV M 2008 IEDM 2