Thermoelastic stresses in SiC single crystals grown by the physical vapor transport method

被引:11
作者
Zhang, ZB
Lu, J
Chen, QS [1 ]
Prasad, V
机构
[1] Chinese Acad Sci, Inst Mech, Beijing 100080, Peoples R China
[2] Florida Int Univ, Dept Mech & Mat Engn, Miami, FL 33174 USA
基金
中国国家自然科学基金;
关键词
silicon carbide; physical vapor transport; thermal stress; thermoelastic; thermal expansion match;
D O I
10.1007/s10409-005-0090-2
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
A finite element-based thermoelastic anisotropic stress model for hexagonal silicon carbide polytype is developed for the calculation of thermal stresses in SiC crystals grown by the physical vapor transport method. The composite structure of the growing SiC crystal and graphite lid is considered in the model. The thermal expansion match between the crucible lid and SiC crystal is studied for the first time. The influence of thermal stress on the dislocation density and crystal quality is discussed.
引用
收藏
页码:40 / 45
页数:6
相关论文
共 15 条
[1]  
Chen QS, 2003, SPR S MAT PROC, P233
[2]   Modeling of transport processes and kinetics of silicon carbide bulk growth [J].
Chen, QS ;
Zhang, H ;
Ma, RH ;
Prasad, V ;
Balkas, CM ;
Yushin, NK .
JOURNAL OF CRYSTAL GROWTH, 2001, 225 (2-4) :299-306
[3]   ON THE SUBLIMATION GROWTH OF SIC BULK CRYSTALS - DEVELOPMENT OF A NUMERICAL PROCESS MODEL [J].
HOFMANN, D ;
HEINZE, M ;
WINNACKER, A ;
DURST, F ;
KADINSKI, L ;
KAUFMANN, P ;
MAKAROV, Y ;
SCHAFER, M .
JOURNAL OF CRYSTAL GROWTH, 1995, 146 (1-4) :214-219
[4]   A COMPARATIVE-STUDY OF THERMAL-STRESS INDUCED DISLOCATION GENERATION IN PULLED GAAS, INP, AND SI CRYSTALS [J].
JORDAN, AS ;
CARUSO, R ;
VONNEIDA, AR ;
NIELSEN, JW .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) :3331-3336
[5]   The elastic constants of silicon carbide: A Brillouin-scattering study of 4H and 6H SiC single crystals [J].
Kamitani, K ;
Grimsditch, M ;
Nipko, JC ;
Loong, CK ;
Okada, M ;
Kimura, I .
JOURNAL OF APPLIED PHYSICS, 1997, 82 (06) :3152-3154
[6]  
Kelly B. T., 1981, PHYS GRAPHITE
[7]   THE ISOTROPIC ASSUMPTION DURING THE CZOCHRALSKI GROWTH OF SINGLE SEMICONDUCTORS CRYSTALS [J].
LAMBROPOULOS, JC .
JOURNAL OF CRYSTAL GROWTH, 1987, 84 (03) :349-358
[8]   Thermal system design and dislocation reduction for growth of wide band gap crystals: application to SiC growth [J].
Ma, RH ;
Zhang, H ;
Dudley, M ;
Prasad, V .
JOURNAL OF CRYSTAL GROWTH, 2003, 258 (3-4) :318-330
[9]   Integrated process modeling and experimental validation of silicon carbide sublimation growth [J].
Ma, RH ;
Zhang, H ;
Ha, S ;
Skowronski, M .
JOURNAL OF CRYSTAL GROWTH, 2003, 252 (04) :523-537
[10]   Challenges in modeling of bulk crystal growth [J].
Müller, G ;
Friedrich, J .
JOURNAL OF CRYSTAL GROWTH, 2004, 266 (1-3) :1-19