Surface evolution and dynamic scaling of sputter-deposited Al thin films on Ti(100) substrates

被引：19

作者：

Liu, ZJ ^{[1
]}

Shen, YG ^{[1
]}

He, LP ^{[1
]}

Fu, T ^{[1
]}

机构：

[1] City Univ Hong Kong, Dept Mfg Engn & Engn Management, MEEM, Kowloon, Hong Kong, Peoples R China

来源：

APPLIED SURFACE SCIENCE | 2004年 / 226卷 / 04期

关键词：

aluminum; atomic force microscopy; surface roughening; thin films;

D O I：

10.1016/j.apsusc.2003.10.049

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The surface morphology and dynamic scaling behavior of Al thin films sputter-deposited on rough Ti(l 0 0) substrates were studied by atomic force microscopy (AFM). It was found that the rough Ti(I 0 0) substrates played a crucial role in determining the surface morphology and roughness evolution of Al thin films at the initial stage of the film growth. Due to the substrate roughness contribution, a smoothing effect of initially rough surfaces could be observed. Also, surface roughness increased at a relatively low rate in the early growth time. The roughness exponent alpha and growth exponent beta for Al film is were determined to be 0.79 +/- 10.05 and 0.16 +/- 10.01, respectively. The observed substrate effect on the evolution of surface roughness was also discussed in terms of the competition between the substrate roughness contribution and the growth-induced roughening. (C) 2003 Elsevier B.V. All rights reserved.

引用

页码：371 / 377

页数：7

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