The accelerating effect of high magnetic field annealing on the interdiffusion behavior of Co/Ni films

被引：12
作者：
Zhao, Yue [1 ]
Li, Donggang [1 ,2 ]
Wang, Kai [1 ]
Wang, Qiang [1 ]
Franczak, Agnieszka [2 ]
Levesque, Alexandra [2 ]
Chopart, Jean-Paul [2 ]
He, Jicheng [1 ]
机构：
[1] Northeastern Univ, Minist Educ, Key Lab Electromagnet Proc Mat, Shenyang 110004, Peoples R China
[2] Univ Reims, LISM, F-51687 Reims 2, France
来源：
MATERIALS LETTERS | 2013年 / 106卷
基金：
中国国家自然科学基金;
关键词：
Diffusion; Thin films; Annealing; X-ray photoelectron spectroscopy; High magnetic field; Interfaces; DIFFUSION; MICROSTRUCTURE; MORPHOLOGY; GRADIENT; IRON; NI;
D O I：
10.1016/j.matlet.2013.05.036
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The effects of high magnetic field annealing on the interdiffusion of Co/Ni bilayer films were investigated in this paper. A clear CoNi alloying zone can be observed by field emission scanning electron microscopy and energy dispersive spectroscopy, for samples annealed with and without magnetic field. Significant Co and Ni interdiffusion was verified by X-ray photoelectron spectroscopy. Based on the thickness of the diffusion layer, the distribution of atoms and the microstructure of interfacial products, the interdiffusion coefficients of the bilayer diffusion couples were calculated. Compared with the no-field case, the interdiffusion coefficient clearly increased when a high magnetic field of 12 T was applied. This effect can be attributed to an increase in the chemical potential gradient induced by magnetic free energy in a high magnetic field. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：190 / 192
页数：3
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