Crystallization and memory programming characteristics of Ge-doped SbTe materials of varying Sb : Te ratio

被引:18
作者
Jeong, Jeung-Hyun [1 ]
Lee, Hyun Seok [1 ]
Lee, Suyoun [1 ]
Lee, Taek Sung [1 ]
Kim, Won Mok [1 ]
Zhe, Wu [1 ,2 ]
Kim, Seul Cham [3 ]
Oh, Kyu Hwan [3 ]
Cheong, Byung-Ki [1 ]
机构
[1] Korea Inst Sci & Technol, Thin Film Mat Res Ctr, Seoul 136791, South Korea
[2] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Taejon 305701, South Korea
[3] Seoul Natl Univ, Dept Mat Sci & Engn, Seoul 151742, South Korea
关键词
NUCLEATION; BEHAVIOR; FILMS;
D O I
10.1088/0022-3727/42/3/035104
中图分类号
O59 [应用物理学];
学科分类号
摘要
A phase change memory (PCM) utilizes resistivity changes accompanying fast transitions from an amorphous to a crystalline phase ( SET) and vice versa ( RESET). An investigation was made on the SET characteristics of PCM cells with Ge-doped SbTe (Ge-ST) materials of two different Sb : Te ratios (4.53 and 2.08). For the material of higher Sb : Te ( 4.53), a SET operation was completed within several tens of nanoseconds via nucleation-free crystallization whereas the material of lower Sb : Te ( 2.08) rendered a slower SET operation requiring several hundred nanoseconds for a nucleation-mediated crystallization. From measurements of nucleation and growth kinetics via laser-induced crystallization, the observed SET characteristics of the former case were found to derive from a growth time about 103 times shorter than the nucleation time and those of the latter from a much shorter nucleation time as well as a longer growth time than in the former case. The measured nucleation kinetics of the lower Sb : Te ( 2.08) material is unexpected from the existing data, which has led us to advance an interesting finding that there occurs a trend-reversing change in the nucleation kinetics of the Ge-ST materials around the eutectic composition ( Sb : Te similar to 2.6); nucleation is accelerated with the increase in the Sb : Te ratio above Sb : Te of 2.6, but with a decrease in the Sb : Te ratio below it.
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页数:6
相关论文
共 17 条
[1]   Highly manufacturable high density phase change memory of 64Mb and beyond [J].
Ahn, SJ ;
Song, YJ ;
Jeong, CW ;
Shin, JM ;
Fai, Y ;
Hwang, YN ;
Lee, SH ;
Ryoo, KC ;
Lee, SY ;
Park, JH ;
Horii, H ;
Ha, YH ;
Yi, JH ;
Kuh, BJ ;
Koh, GH ;
Jeong, GT ;
Jeong, HS ;
Kim, K ;
Ryu, BI .
IEEE INTERNATIONAL ELECTRON DEVICES MEETING 2004, TECHNICAL DIGEST, 2004, :907-910
[2]   Phase-change media for high-numerical-aperture and blue-wavelength recording [J].
Borg, HJ ;
van Schijndel, M ;
Rijpers, JCN ;
Lankhorst, MHR ;
Zhou, GF ;
Dekker, MJ ;
Ubbens, IPD ;
Kuijper, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2001, 40 (3B) :1592-1597
[3]   LASER-INDUCED CRYSTALLIZATION PHENOMENA IN GETE-BASED ALLOYS .1. CHARACTERIZATION OF NUCLEATION AND GROWTH [J].
COOMBS, JH ;
JONGENELIS, APJM ;
VANESSPIEKMAN, W ;
JACOBS, BAJ .
JOURNAL OF APPLIED PHYSICS, 1995, 78 (08) :4906-4917
[4]  
GASKELL DR, 1981, INTRO METALLURGICAL, P397
[5]   An experimental investigation on the switching reliability of a phase change memory device with an oxidized TiN electrode [J].
Kang, Dae-Hwan ;
Kim, In Ho ;
Jeong, Jeung-hyun ;
Cheong, Byung-ki ;
Ahn, Dong-Ho ;
Lee, Dongbok ;
Kim, Hyun-Mi ;
Kim, Ki-Bum ;
Kim, Soo-Hyun .
JOURNAL OF APPLIED PHYSICS, 2006, 100 (05)
[6]   Time-resolved analysis of the set process in an electrical phase-change memory device [J].
Kang, DH ;
Cheong, B ;
Jeong, J ;
Lee, TS ;
Kim, IH ;
Kim, WM ;
Huh, JY .
APPLIED PHYSICS LETTERS, 2005, 87 (25) :1-3
[7]   A 0.1-μm 1.8-V 256-Mb phase-change random access memory (PRAM) with 66-MHz synchronous burst-read operation [J].
Kang, Sangbeom ;
Cho, Woo Yeong ;
Cho, Beak-Hyung ;
Lee, Kwang-Jin ;
Lee, Chang-Soo ;
Oh, Hyung-Rok ;
Choi, Byung-Gil ;
Wang, Qi ;
Kim, Hye-Jin ;
Park, Mu-Hui ;
Ro, Yn Hwan ;
Kim, Suyeon ;
Ha, Choong-Duk ;
Kim, Ki-Sung ;
Kim, Young-Ran ;
Kim, Du-Eung ;
Kwak, Choong-Keun ;
Byun, Hyun-Geun ;
Jeong, Gitae ;
Jeong, Hongsik ;
Kim, Kinam ;
Shin, YunSueng .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 2007, 42 (01) :210-218
[8]   Crystallization behavior of as-deposited, melt quenched, and primed amorphous states of Ge2Sb2.3Te5 films [J].
Khulbe, PK ;
Wright, EM ;
Mansuripur, M .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) :3926-3933
[9]   Crystallization behavior of Ge-doped eutectic Sb70Te30 films in optical disks [J].
Khulbe, PK ;
Hurst, T ;
Horie, M ;
Mansuripur, M .
APPLIED OPTICS, 2002, 41 (29) :6220-6229
[10]  
Kim K, 2007, MICROSYST TECHNOL, V13, P145, DOI [10.1007/S00542-006-0150-y, 10.1007/s00542-006-0150-y]