Interface behaviour during the self-joining of Si3N4 using a Nb-foil interlayer

被引:19
作者
Lemus-Ruiz, J [1 ]
León-Patiño, CA [1 ]
Aguilar-Reyes, EA [1 ]
机构
[1] Univ Michoacana, Inst Invest Met, Morelia 58000, Michoacan, Mexico
关键词
diffusion bonding; silicon nitride; niobium; characterization;
D O I
10.1016/j.scriptamat.2005.12.014
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This work focuses on various aspects of diffusion bonding of Nb-foil interlayer during the self-joining of Si3N4. Joints were produced by hot-uniaxial pressing. The results showed that Si3N4 was solid-state bonded to Nb at temperatures ranging from 1200 to 1600 degrees C. Nb5Si3 and NbSi2 were detected at the joining interface. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:1339 / 1343
页数:5
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