Potentiodynamically deposited nickel oxide (NiO) nanoflakes for pseudocapacitors

被引：39
作者：
Jagadale, A. D. [1 ]
Kumbhar, V. S. [1 ]
Dhawale, D. S. [1 ]
Lokhande, C. D. [1 ]
机构：
[1] Shivaji Univ, Dept Phys, Thin Film Phys Lab, Kolhapur 416004, MS, India
来源：
JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 2013年 / 704卷
关键词：
Potentiodynamic deposition; Nickel oxide; Pseudocapacitors; Electrochemical measurements; THIN-FILMS; BIRNESSITE MNO2; NANOPARTICLES; BEHAVIOR; ELECTRODEPOSITION; CONVERSION; STABILITY; MN3O4;
D O I：
10.1016/j.jelechem.2013.06.020
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
The present work demonstrates the preparation of NiO nanoflakes via potentiodynamic electrodeposition method. The structural and morphological analyses of the film have been presented. The pseudocapacitive properties are tested using cyclic voltammetry, charge-discharge and electrochemical impedance spectroscopy. The maximum value of specific capacitance obtained is 222 Fg(-1). (C) 2013 Elsevier B.V. All rights reserved.
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收藏
页码：90 / 95
页数：6
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