Structural analysis of monolayered and bilayered SnO2 thin films

被引：4

作者：

Djerdj, Igor ^{[1
]}

Gracin, Davor ^{[1
]}

Juraic, Krunoslav ^{[1
]}

Meljanac, Daniel ^{[1
]}

Bogdanovic-Radovic, Ivancica ^{[1
]}

Pletikapic, Galja ^{[1
]}

机构：

[1] Rudjer Boskovic Inst, HR-10002 Zagreb, Croatia

来源：

SURFACE & COATINGS TECHNOLOGY | 2012年 / 211卷

关键词：

Transparent conductive oxides; Thin film; X-ray diffraction; Rietveld analysis; Preferred orientation; DEPOSITION; EVAPORATION; MORPHOLOGY;

D O I：

10.1016/j.surfcoat.2011.06.045

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Mono- and bilayered undoped and fluorine doped SnO2 thin films have been successfully prepared at optimized postdeposition temperatures of 590 and 610 degrees C by the atmospheric pressure chemical vapor deposition method. The microstructural properties of as-deposited films were thoroughly examined using the Rietveld refinement of powder-like XRD patterns, while the film surface has been probed using atomic field microscopy. The structural parameters were correlated to the deposition parameters and interesting findings were revealed. Finally, the specific electrical resistivity of the thin films has been measured and correlated with the optical transmittance. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：24 / 28

页数：5

共 19 条

[1] Structural investigations of nanocrystalline TiO2 samples [J].