Electrical and light-emitting properties of homoepitaxial diamond p-i-n junction

被引:26
|
作者
Makino, Toshiharu [1 ]
Tokuda, Norio [1 ]
Kato, Hiromitsu [1 ]
Kanno, Shokichi [1 ]
Yamasaki, Satoshi [1 ,2 ]
Okushi, Hideyo [1 ,3 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Nanotechnol Res Inst, Tsukuba, Ibaraki 3058568, Japan
[2] Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058577, Japan
[3] Natl Inst Mat Sci, Sensor Mat Ctr, Tsukuba, Ibaraki 3050044, Japan
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2008年 / 205卷 / 09期
基金
日本科学技术振兴机构;
关键词
D O I
10.1002/pssa.200879717
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated the electrical and light-emitting characteristics of (001)-oriented homoepitaxial diamond p-i-n junction diodes with the boron-doped p-type, non-doped intrinsic, and phosphorus-doped n-type layers formed by applying an optimized homoepitaxial growth technique based on microwave plasma-enhanced chemical vapor deposition. High-performance p-i-n junction characteristics were confirmed from current-voltage and capacitance-voltage properties. A strong ultraviolet light emission at around 240 nm due to free exciton recombination was observed at a forward current of over 6 mA, while the broad visible light emission from deep levels was significantly suppressed compared to that of reported electroluminescence in diamond p-n junctions. It was elucidated that the excitonic emission intensity increases superlinearly for the current dependence and is stable even at the high temperature of 200 degrees C. (C) 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:2200 / 2206
页数:7
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