Antibacterial behavior of TaN-Ag nanocomposite thin films with and without annealing

被引：46
作者：
Hsieh, J. H. [2 ]
Tseng, C. C. [1 ]
Chang, Y. K. [3 ]
Chang, S. Y. [1 ]
Wu, W. [1 ]
机构：
[1] Natl Chung Hsing Univ, Dept Mat Engn, Taichung 402, Taiwan
[2] Mingchi Univ Technol, Dept Mat Engn, Taipei 24301, Taiwan
[3] Mingchi Univ Technol, Dept Biochem Engn, Taipei 24301, Taiwan
来源：
SURFACE & COATINGS TECHNOLOGY | 2008年 / 202卷 / 22-23期
关键词：
Cosputtering; Nanocomposite thin films; TaN-Ag; C-AFM;
D O I：
10.1016/j.surfcoat.2008.06.107
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
TaN-Ag nanocomposite films were deposited by reactive cosputtering on Si. The films were then annealed using RTA (rapid thermal annealing) at 350 degrees C for 2, 4 and 8 min respectively to induce the nucleation and growth of Ag particles in TaN matrix and on film Surface. FESEM (field emission scanning electron microscopy) were applied to characterize Ag nanoparticles emerged on the surface of TaN-Ag thin films. The effect of annealing on the antibacterial properties of these films was studied. The results first confirm that annealing by RTA can cause Ag nanoparticles with various sizes to emerge on the TaN surface. Consequently, the antibacterial behavior will vary, depending on the amount and size of the surfaced Ag particles. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码：5586 / 5589
页数：4
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