Tuning stress-induced magnetic anisotropy and high frequency properties of FeCo films deposited on different curvature substrates

被引：16

作者：

Wang, Z. K. ^{[1
]}

Feng, E. X. ^{[1
]}

Liu, Q. F. ^{[1
]}

Wang, J. B. ^{[1
]}

Xue, D. S. ^{[1
]}

机构：

[1] Lanzhou Univ, Inst Appl Magnet, Key Lab Magnetism & Magnet Mat, Minist Educ, Lanzhou 730000, Peoples R China

来源：

PHYSICA B-CONDENSED MATTER | 2012年 / 407卷 / 18期

关键词：

Stress; Thin films; Magnetic anisotropy; Resonance frequency; FERROMAGNETIC-RESONANCE; FIELD;

D O I：

10.1016/j.physb.2012.06.012

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

It is important to control magnetic anisotropy of ferromagnetic materials. In this work, FeCo thin films are deposited on the curving substrates by electrochemical deposition to adjust the stress-induced magnetic anisotropy. The compressive stress is produced in the as-deposited films after the substrates are flattened. A simplified theoretical model of ferromagnetic resonance is utilized to measure the intrinsic magnetic anisotropy field and saturation magnetization. The results show that the stress-induced magnetic anisotropy and the resonance frequency increase with the increase of substrate curvature. The induced easy axis is perpendicular to the compressive stress direction. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：3872 / 3875

页数：4

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