A Stitching Algorithm for Measuring Large Areas Using Scanning Electron Microscopes

被引：4

作者：

Hong, Won-Pyo ^{[1
]}

Lee, Seok-Woo ^{[1
]}

Choi, Hon-Zong ^{[1
]}

机构：

[1] Korea Inst Ind Technol, Ansan 426791, South Korea

来源：

INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING | 2013年 / 14卷 / 01期

关键词：

SEM (Scanning Electron Microscope); Stitching; Split image; Image Processing; Edge Detection; Pixel;

D O I：

10.1007/s12541-013-0020-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

SEM is very useful measuring equipment in the micro and nano area. In general, it is not used to accurately measure the size information of a sample, but to measure its shape characteristics. In addition, it has a measuring area that is limited to just several micro-meters, and it is unsuitable for accurate measurements larger than several tens of micro meters. This paper proposed a stitching algorithm for the split electron beam images using an image processing technique to minimize measurement error. Experiments were conducted targeting circular and rectangular shapes 500 nm similar to 10 mu m in diameter and line length. Finally, stitching accuracy was verified through a comparison with AFM measuring data.

引用

页码：147 / 151

页数：5

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