Atomic Layer Deposited Hf0.5Zr0.5O2-based Flexible Memristor with Short/Long-Term Synaptic Plasticity

被引:45
作者
Wang, Tian-Yu [1 ]
Meng, Jia-Lin [2 ,3 ,4 ]
He, Zhen-Yu [1 ]
Chen, Lin [1 ]
Zhu, Hao [1 ]
Sun, Qing-Qing [1 ]
Ding, Shi-Jin [1 ]
Zhang, David Wei [1 ]
机构
[1] Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China
[2] Tianjin Univ, Frontier Sci Ctr Synthet Biol, Tianjin 300072, Peoples R China
[3] Tianjin Univ, Key Lab Syst Bioengn MOE, Tianjin 300072, Peoples R China
[4] Tianjin Univ, Sch Chem Engn & Technol, Tianjin 300072, Peoples R China
来源
NANOSCALE RESEARCH LETTERS | 2019年 / 14卷 / 1期
关键词
Atomic layer deposition; Low-temperature process; Flexible electronics; Synaptic plasticity; DEVICE;
D O I
10.1186/s11671-019-2933-y
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Artificial synapses are the fundamental of building a neuron network for neuromorphic computing to overcome the bottleneck of the von Neumann system. Based on a low-temperature atomic layer deposition process, a flexible electrical synapse was proposed and showed bipolar resistive switching characteristics. With the formation and rupture of ions conductive filaments path, the conductance was modulated gradually. Under a series of pre-synaptic spikes, the device successfully emulated remarkable short-term plasticity, long-term plasticity, and forgetting behaviors. Therefore, memory and learning ability were integrated to the single flexible memristor, which are promising for the next-generation of artificial neuromorphic computing systems.
引用
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页数:6
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