Colloidal monolayer at the air/water interface: Large-area self-assembly and in-situ annealing

被引：11

作者：

Yu, Jie ^{[1
]}

Zheng, Lu ^{[1
]}

Geng, Chong ^{[1
]}

Wang, Xiuyu ^{[1
]}

Yan, Qingfeng ^{[1
,2
]}

Wang, Xiaoqing ^{[1
]}

Shen, Guangqiu ^{[1
]}

Shen, Dezhong ^{[1
]}

机构：

[1] Tsinghua Univ, Dept Chem, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China

[2] Shandong Univ, State Key Lab Crystal Mat, Jinan 250100, Peoples R China

来源：

THIN SOLID FILMS | 2013年 / 544卷

基金：

高等学校博士学科点专项科研基金;

关键词：

Colloidal self-assembly; Tunable interstice size; Nanosphere lithography; Solvent vapor annealing; NANOSPHERE LITHOGRAPHY; ARRAYS; SIZE; CRYSTALS; MASKS; NANOLITHOGRAPHY; NANOPARTICLE; GROWTH;

D O I：

10.1016/j.tsf.2012.12.069

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nanosphere lithography (NSL) has been proved to be an inexpensive, inherently parallel, high-throughput, and materials-general technique for the fabrication of ordered nanoparticle arrays. In this work, we present the fabrication of large-area and exclusively single layer polystyrene colloidal crystal using an air/water interface self-assembly method. The interstice size in the floating colloidal monolayer can be manipulated by a subsequent in-situ annealing with a saturated organic solvent vapor. As a result, large-area, transferrable, and high-crystalline-integrity colloidal masks with controllable interstice sizes for NSL application are achieved. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：557 / 561

页数：5

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