Photosensitivity of structures based on silicon carbide anodized layers

被引：0
|
作者：
Lebedev, AA [1 ]
Lebedev, AA [1 ]
Rud, VY [1 ]
Rud, YV [1 ]
Strelchuk, AM [1 ]
机构：
[1] ST PETERSBURG STATE TECH UNIV,ST PETERSBURG,RUSSIA
来源：
PISMA V ZHURNAL TEKHNICHESKOI FIZIKI | 1996年 / 22卷 / 17期
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中图分类号：
O59 [应用物理学];
学科分类号：
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页码：59 / 63
页数：5
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